The laboratory participates in training of
undergraduates of the Chemical Department of the Latvian University in the
physical chemistry specialty according to a program: "The mechanism
of electrodeposition and structure formation of metals and metal-inorganic
compound thin layers on several materials (on surfaces of light and hard
alloys as well as on vacuum-sputtered metal surfaces for modification of
material surfaces)". The
Laboratory is: -
accredited
as a testing laboratory (LATAK-T-088) of quality parameters of metal
structure and chemical composition of metal coatings, metal substrata and
of electrolytes; -
included
(№
90) in the TICQA project: "The European Information Service on
Providers of Conformity Assessment Activities" (testing of basic
metals, metal products and welding, optical and medical instruments,
construction). -
included
in the Canadian catalogue "Survey of Corrosion Research
Laboratories" (International Corrosion Council) 1998; -
a
member of "The Latvian Electronic and Electrical Manufacture"; -
a
member of the Latvian Association of Quality. Staff - 13 leading engineers.
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Research Area
The fields of research and technological development: 1. Mechanisms of electrodeposition and formation of
structure of metals and composite coatings metal-inorganic compound onto
light, hard alloys and vacuum evaporated metal substrates. 2. Interdiffusion of substrate metals and coatings,
formation of intermetallic layers, electrodeposition of barrier layers,
preventing interdiffusion. 3. Chemical, physicochemical and physical testing for
metal coatings, metals, metal articles and electrolytes: - determination of qualitative indices of coatings and rolled, cast etc. metal articles; - determination of chemical composition, structure, sort (chemical and X-ray phase analysis, optical, scanning and transmission electron microscopy).
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Technology and Objects
1. Electrodeposition and formation of structure of metals: tin, gold, nickel-boron, permalloy functional coating on to: - copper and copper alloys; - vacuum evaporated metal substrates - copper, permalloy and titanium; - hard metals as niobium to produce superconductive coatings Nb3Sn, and titanium; - aluminium and Al-alloys; - barrier layers Co-W (48-53 wt% W) preventing interdiffusion Au-Ni-Cu, Au-Cu and formation of intermetallic layers; - barrier layers Ni-B (6-8 wt%) preventing interdiffusion and formation of intermetallic layers Cu-Sn, Au-Cu. 2. Electrodeposition of black, solderable conductive
coatings of: - tin/Chevrel phase PbMo6S8 to produce superconductive coatings (20-80 wt% PbMo6S8); - tin/niobium carbonitride (9-80 wt% niobium carbonitride); - tin/titanium-niobium carbonitride (55-70 wt% titanium-niobium carbonitride); - tin/titanium nitride (5-70 wt% titanium nitride); and composite coatings of: - tin/penta-calciumphosphat Ca5(PO4)3(OH) [45 wt% Ca5(PO4)3(OH)]; - cobalt-tungsten alloys/penta-calciumphosphat Ca5(PO4)3(OH); - nickel/zirconium oxide (50 wt% ZrO2+Y2O3). Return to Top | |||||||||||||
Last modified: June 19, 2003 |